李秀湖, 邓蓉蓉, 李艳, 徐存英, 华一新, 张启波. 添加剂在离子液体电沉积金属及合金中的应用[J]. 工程科学学报, 2024, 46(4): 657-675. DOI: 10.13374/j.issn2095-9389.2023.02.17.002
引用本文: 李秀湖, 邓蓉蓉, 李艳, 徐存英, 华一新, 张启波. 添加剂在离子液体电沉积金属及合金中的应用[J]. 工程科学学报, 2024, 46(4): 657-675. DOI: 10.13374/j.issn2095-9389.2023.02.17.002
LI Xiuhu, DENG Rongrong, LI Yan, XU Cunying, HUA Yixin, ZHANG Qibo. Application of additives for the electrodeposition of metals and alloys from ionic liquids[J]. Chinese Journal of Engineering, 2024, 46(4): 657-675. DOI: 10.13374/j.issn2095-9389.2023.02.17.002
Citation: LI Xiuhu, DENG Rongrong, LI Yan, XU Cunying, HUA Yixin, ZHANG Qibo. Application of additives for the electrodeposition of metals and alloys from ionic liquids[J]. Chinese Journal of Engineering, 2024, 46(4): 657-675. DOI: 10.13374/j.issn2095-9389.2023.02.17.002

添加剂在离子液体电沉积金属及合金中的应用

Application of additives for the electrodeposition of metals and alloys from ionic liquids

  • 摘要: 近年来,基于离子液体电沉积制备金属和合金镀层已被广泛应用于多个研究领域,其电沉积过程可以克服传统水溶液体系电化学窗口窄、易受析氢副反应干扰等缺陷;相较于高温熔盐体系,离子液体可在温和条件下电沉积制备活泼金属及其合金. 离子液体具有较高的黏度,导致离子迁移速率低,电沉积过程中易产生浓差极化,从而影响沉积产物的品质和性能. 通过向离子液体电沉积体系中引入添加剂可以改变活性物种的电化学还原电位,进而影响晶粒的电化学结晶过程,显著改善沉积层的微观结构和性能. 本文归纳总结了添加剂对离子液体中电沉积活泼金属、过渡金属和贵金属及其合金等方面的研究进展,系统分析了当前添加剂在离子液体电沉积金属及合金过程中的作用机理、效用和局限性,并展望了未来离子液体电沉积添加剂的重点研究方向.

     

    Abstract: Ionic liquids (ILs) are a new class of green electrolyte systems owing to their unique characteristics of no proton interference, wide electrochemical window, low vapor pressure, good electrical conductivity, and low melting point. Electrodeposition is a promising high-precision coating method for the tunable preparation of high-performance metal-based film materials. Remarkably, electrodeposition can be easily tuned by tailoring the operating parameters, such as current density, type of current control, potential applied and the deposition model, electrolyte composition and pH, temperature, and the choice of additives, thus garnering various industrial applications. Recently, preparing metal and alloy coatings electrodeposited from ILs has been widely used in materials synthesis, catalysis, electrochemical energy storage, and other fields. Metal and alloy electrodeposition from ILs can address the drawbacks of conventional aqueous systems, such as limited electrochemical windows and easy interference from hydrogen evolution side reactions. Unlike high-temperature molten salts, ILs can be used for the electrodeposition of active metals (such as aluminum, titanium, and rare earth metals) and their alloys at low temperatures and under relatively mild conditions. Nevertheless, ILs have high viscosity, leading to a low ion migration rate and easy-to-produce concentration polarization during the electrodeposition process, thus impacting the quality and performance of the deposited products and restricting large-scale preparation. Introducing efficient additives can optimize the solvent environment, modify the electrochemical reduction potential of the active species in the IL electrodeposition system, influence the electrochemical crystallization process of the electrodeposited grains, and significantly enhance the microstructure and performance of the deposited layer. However, an effective screening approach is still required, and the action mechanism of additives should be intensively studied. Examining highly efficient and functional additives appropriate for IL electrodeposition systems is crucial to advancing their industrial applications; however, they still face challenges. In this review, recent research progress on additives for the electrodeposition of active, transition, and noble metals and their alloys from ILs is summarized. Moreover, the mechanism, utility, and limitations of the existing additives during the electrodeposition process are systematically analyzed, and the future research directions of these additives for metal and alloy electrodeposition from ILs are prospected. This review can provide researchers with a comprehensive and systematic understanding and stimulate research breakthroughs to accelerate the large-scale application of additive-assisted electrodeposition technology from ILs.

     

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