葛昌纯, 夏元洛, 谢建刚, 黄向东, 丁宇, 张建伟. 由氨解法制备的Si3N4粉末的表面元素状态[J]. 工程科学学报, 1991, 13(S2): 1-6. DOI: 10.13374/j.issn1001-053x.1991.s2.001
引用本文: 葛昌纯, 夏元洛, 谢建刚, 黄向东, 丁宇, 张建伟. 由氨解法制备的Si3N4粉末的表面元素状态[J]. 工程科学学报, 1991, 13(S2): 1-6. DOI: 10.13374/j.issn1001-053x.1991.s2.001
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Ge Changchun, Xia Yuanluo, Xie Jiangang, Huang Xiangdong, Ding Yu, Zhang Jianwei. Surface State of Fine Si3N4 Powders Made from Thermal Decomposition of SilicOn-Imide[J]. Chinese Journal of Engineering, 1991, 13(S2): 1-6. DOI: 10.13374/j.issn1001-053x.1991.s2.001
Citation: Ge Changchun, Xia Yuanluo, Xie Jiangang, Huang Xiangdong, Ding Yu, Zhang Jianwei. Surface State of Fine Si3N4 Powders Made from Thermal Decomposition of SilicOn-Imide[J]. Chinese Journal of Engineering, 1991, 13(S2): 1-6. DOI: 10.13374/j.issn1001-053x.1991.s2.001
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由氨解法制备的Si3N4粉末的表面元素状态

Surface State of Fine Si3N4 Powders Made from Thermal Decomposition of SilicOn-Imide

    摘要
  • 摘要: 用XPS表面分析,研究了由氨解法在不同温度下热解所得的Si3N4粉末,并与由硅粉氮化所得的商用Si3N4粉末作了比较。由氨解法制备的Si3N4粉末其表面存在两种状态的氧:结合状态的氧和吸附态的氧,其表面组成为Si2.2-2.7N2.9-3.7O。由硅粉氮化所制得Si3N4其表面也存在两种状态的氧,其表面组成则为Si0.8N0.8O。

     

    Abstract: Si3N4 powders made from imide process and thermal decomposed at different temperatures have investigated by XPS surface analysis; They were compared with a commercial Si3N4 powder made with nitridation process. Oxygen both in combined form of Si2.2-2.7N2.9-3.7O layer and absorbed form were found on the powder surface, in contrast to Si0.8 N0.8O layer and absorbed form in the case of Si3N4 powders made from Si aitridation.

     

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