陈俊, 杨保雄, 王建军, 吕反修. 离子束轰击法金刚石薄膜抛光[J]. 工程科学学报, 1993, 15(5): 503-507. DOI: 10.13374/j.issn1001-053x.1993.05.031
引用本文: 陈俊, 杨保雄, 王建军, 吕反修. 离子束轰击法金刚石薄膜抛光[J]. 工程科学学报, 1993, 15(5): 503-507. DOI: 10.13374/j.issn1001-053x.1993.05.031
Chen Jun, Yang Baoxiong, Wang Jianjun, Lu Fanxiu. Polishing of CVD Diamond Films by Ion Beam Irradiation[J]. Chinese Journal of Engineering, 1993, 15(5): 503-507. DOI: 10.13374/j.issn1001-053x.1993.05.031
Citation: Chen Jun, Yang Baoxiong, Wang Jianjun, Lu Fanxiu. Polishing of CVD Diamond Films by Ion Beam Irradiation[J]. Chinese Journal of Engineering, 1993, 15(5): 503-507. DOI: 10.13374/j.issn1001-053x.1993.05.031

离子束轰击法金刚石薄膜抛光

Polishing of CVD Diamond Films by Ion Beam Irradiation

  • 摘要: 本文采用氩离子束轰击法,对不同晶体学表面形貌的CVD金刚石膜进行抛光处理。结果表明,对不同表面形貌的金刚石膜,应合理选择离子束轰击入射角,提高离子束加速电压有利于提高抛光效率,(100)择优生长的金刚石膜最容易得到高的表面平整度。

     

    Abstract: To improve the surface roughness of CVD diamond films, ion beam milling was used to polish the film. The results of this experiment indicate that the ideal incident angle of ion beam varies with the surface morphology and that high accelaration voltage of ion beam is beneficial to achieving high polishing rate. It was also found that the film exposing (100) facets can be most easily polished to achieve Ra 28 nm surface roughness.

     

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