Li Jiuqing, Lu Cuiying, Shen Zhuoshen, Hu Maopu, Wang Baojue, Pu Yumei. Improvement of Corrosion Resistance of Transistor Leads by Compositive Gold Plating[J]. Chinese Journal of Engineering, 1988, 10(2): 234-240. DOI: 10.13374/j.issn1001-053x.1988.02.034
Citation: Li Jiuqing, Lu Cuiying, Shen Zhuoshen, Hu Maopu, Wang Baojue, Pu Yumei. Improvement of Corrosion Resistance of Transistor Leads by Compositive Gold Plating[J]. Chinese Journal of Engineering, 1988, 10(2): 234-240. DOI: 10.13374/j.issn1001-053x.1988.02.034
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Improvement of Corrosion Resistance of Transistor Leads by Compositive Gold Plating

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  • This paper reports the new technology which improves the corrosion resistance of transtor leads by compositive gold plating. A plating system consisting of dark nickel, Ni-Al2O3 compositive plating and acidic pulse gold plating is plated on Kovar leads. The porous gold plating system decreases the tendency of corrosion fracture distinctly.
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