Surface State of Fine Si<sub>3</sub>N<sub>4</sub> Powders Made from Thermal Decomposition of SilicOn-Imide

Ge Changchun; Xia Yuanluo; Xie Jiangang; Huang Xiangdong; Ding Yu; Zhang Jianwei

doi:10.13374/j.issn1001-053x.1991.s2.001

Ge Changchun, Xia Yuanluo, Xie Jiangang, Huang Xiangdong, Ding Yu, Zhang Jianwei. Surface State of Fine Si3N4 Powders Made from Thermal Decomposition of SilicOn-Imide[J]. Chinese Journal of Engineering, 1991, 13(S2): 1-6. DOI: 10.13374/j.issn1001-053x.1991.s2.001

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Surface State of Fine Si₃N₄ Powders Made from Thermal Decomposition of SilicOn-Imide

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Si₃N₄ powders made from imide process and thermal decomposed at different temperatures have investigated by XPS surface analysis; They were compared with a commercial Si₃N₄ powder made with nitridation process. Oxygen both in combined form of Si_2.2-2.7N_2.9-3.7O layer and absorbed form were found on the powder surface, in contrast to Si_0.8 N_0.8O layer and absorbed form in the case of Si₃N₄ powders made from Si aitridation.

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Surface State of Fine Si3N4 Powders Made from Thermal Decomposition of SilicOn-Imide

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Surface State of Fine Si₃N₄ Powders Made from Thermal Decomposition of SilicOn-Imide