Dependence of Structure Stability of Electrodepositing Amorphous Cr-C and Ni-P on C,P Contents

The dependence of structure stability of electrodepositing amorphous Cr-C and Ni-P films on their components have been researched by action of high accelerated voltage electronic cluster. It was shown that, when temperature was far lower than crystalline temperature, the lower the content of submetallic element in films,the bigger the extent to crystallize.