牛晓燕, 刘明泽, 董国强, 王玉江(通讯作者), 田浩亮. 基底偏压对电弧/磁控复合技术制备CrAlN耐磨涂层性能影响规律研究[J]. 工程科学学报. DOI: 10.13374/j.issn2095-9389.2024.04.26.003
引用本文: 牛晓燕, 刘明泽, 董国强, 王玉江(通讯作者), 田浩亮. 基底偏压对电弧/磁控复合技术制备CrAlN耐磨涂层性能影响规律研究[J]. 工程科学学报. DOI: 10.13374/j.issn2095-9389.2024.04.26.003
Study on the influence of substrate bias on the properties of CrAlN wear-resistant coating prepared by arc/magnetron composite technology[J]. Chinese Journal of Engineering. DOI: 10.13374/j.issn2095-9389.2024.04.26.003
Citation: Study on the influence of substrate bias on the properties of CrAlN wear-resistant coating prepared by arc/magnetron composite technology[J]. Chinese Journal of Engineering. DOI: 10.13374/j.issn2095-9389.2024.04.26.003

基底偏压对电弧/磁控复合技术制备CrAlN耐磨涂层性能影响规律研究

Study on the influence of substrate bias on the properties of CrAlN wear-resistant coating prepared by arc/magnetron composite technology

  • 摘要: 本文利用中频磁控溅射与电弧离子镀复合沉积技术在不锈钢基体上沉积CrAlN涂层。利用SEM、EDS、XRD、纳米压痕测试、划痕测试以及摩擦磨损试验等手段,系统地研究了基底偏压对CrAlN涂层微观形貌、力学性能及摩擦磨损性能的影响。随着基底偏压的增大,涂层表面经历了由孔洞、大颗粒向密实平滑的形态演变。在-30 V基底偏压下制备的涂层表现出多个强衍射峰;-60 V偏压下,涂层沿(200)晶面方向择优生长。过高的基底偏压(-150 V)加剧了沉积过程中的二次溅射效应,导致涂层沉积速率降低,并伴随晶格松弛和重结晶现象。此外,随着基底偏压的增加,涂层的硬度和弹性模量均呈先增加后减少趋势。在-60 V基底偏压下,涂层表现出较低的磨损率,而较高偏压下的涂层磨损机制转变为严重的磨粒磨损,导致涂层大量剥落,暴露出基底材料。通过调控基底偏压,可以有效优化CrAlN涂层的组织结构、力学性能和摩擦磨损性能。在-60 V基底偏压下制备的CrAlN涂层展现出优异的力学性能和耐磨性,为实际应用中提升涂层性能提供了重要的理论和实验依据。

     

    Abstract: In this study, a combined deposition technique involving medium-frequency magnetron sputtering and arc ion plating was employed to deposit CrAlN coatings onto stainless steel substrates. Through comprehensive analysis using SEM, EDS, XRD, nanoindentation testing, scratch testing, and friction and wear testing methods, the influence of substrate bias voltage on the microstructural morphology, mechanical properties, and frictional characteristics of the CrAlN coatings was systematically investigated. With an increase in substrate bias voltage, the coating surface exhibited a morphological evolution from porous structures and large particles to a dense and smooth state. The coating prepared under a substrate bias of -30 V exhibited multiple strong diffraction peaks. Under a substrate bias of -60 V, the coating preferentially grew along the (200) crystal plane. Excessive substrate bias (-150 V) exacerbated the secondary sputtering effect during deposition, resulting in a decreased deposition rate accompanied by lattice relaxation and recrystallization. Furthermore, an increase in substrate bias initially enhanced the hardness and elastic modulus of the coating before subsequently decreasing them. Under a substrate bias of -60 V, the coating demonstrated lower wear rates, while higher biases transformed its wear mechanism into severe abrasive wear, leading to significant peeling off and exposure of the underlying material. By adjusting the substrate bias voltage, it is possible to effectively optimize the microstructure, mechanical properties, frictional behavior, and wear resistance of CrAlN coatings. Notably, CrAlN coatings prepared under a substrate bias of -60 V exhibited exceptional mechanical properties and wear resistance; thus providing crucial theoretical and experimental foundations for enhancing their performance in practical applications.

     

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