基底偏压对电弧/磁控复合技术制备CrAlN耐磨涂层性能的影响规律

Influence of substrate bias on the properties of CrAlN wear-resistant coating prepared by arc/magnetron composite technology

  • 摘要: 利用中频磁控溅射与电弧离子镀复合沉积技术在不锈钢基体上沉积CrAlN涂层. 利用扫描电镜(SEM)、X射线能谱(EDS)、X射线衍射(XRD)、纳米压痕测试、划痕测试以及摩擦磨损试验等手段,系统地研究了基底偏压对CrAlN涂层微观形貌、力学性能及摩擦磨损性能的影响. 随着基底偏压的增大,涂层表面经历了由较为粗糙的孔洞、大颗粒向平滑的形态演变. 在−30 V基底偏压下(绝对值表示大小)制备的涂层表现出多个强衍射峰;−60 V偏压下,涂层沿(200)晶面方向择优生长. 过高的基底偏压(−150 V)加剧了沉积过程中的二次溅射效应,导致涂层沉积速率降低,并出现晶格松弛和重结晶现象. 此外,随着基底偏压的增加,涂层的硬度和弹性模量均呈先增加后减少趋势. 在−60 V基底偏压下,涂层表现出较低的磨损率,而较高偏压下的涂层磨损机制转变为严重的磨粒磨损,涂层磨损严重. 通过调控基底偏压,可以有效优化CrAlN涂层的组织结构、力学性能和摩擦磨损性能. 在−60 V基底偏压下制备的CrAlN涂层展现出优异的力学性能和耐磨性,为实际应用中提升涂层性能提供了重要的理论和实验依据.

     

    Abstract: CrAlN coatings were deposited onto stainless steel substrates using mid-frequency magnetron sputtering and arc-ion plating. The research comprehensively analyzes how varying substrate bias voltage influences the microstructural morphology, mechanical properties, and frictional behavior of the coatings using scanning electron microscopy, energy-dispersive spectroscopy, X-ray diffraction, nanoindentation, scratch test, and friction and wear tests. As the substrate bias voltage increases, the coated surface evolves from a porous with large grains to a dense and smooth state. At a bias of −60 V, the coating exhibited minimal surface particles and pores, resulting in the best overall surface quality and excellent adhesion to the substate. Moreover, all coatings displayed the composite properties of metal and metal nitride mixtures. In addition, substrate bias, a key process parameter, was found to affect particle activity and sputtering yield, thereby modulating element distribution in the coating and coating properties. The CrN, AlN, and CrAlN phases with face-centered cubic structures were observed by XRD. In particular, the addition of Al elements caused the diffraction peak of the CrAlN phase to shift to higher angles. At a substrate bias of −30 V, the coating exhibited multiple strong diffraction peaks. When the substrate bias was −60 V, the coating preferentially grew along the (200) crystal plane. However, an excessive substrate bias (−150 V) exacerbated the secondary sputtering effect during deposition, resulting in a decreased deposition rate, lattice relaxation, and recrystallization. Coatings prepared with different bias voltages consistently exhibited compressive stress, which increases with the bias voltage and, to a certain extent, improves the mechanical properties. The combined effect of growth and thermal stresses results in a higher residual stress for coatings prepared at a −150 V substrate bias. Increasing the substrate bias initially enhanced the hardness and elastic modulus of the coating; however, these properties eventually declined. The peak hardness at a −60 V substrate bias is attributed to lattice distortion, the Al solid solution in the CrN lattice, and internal stresses. Moreover, coatings at this bias level exhibited better elastic recovery and plastic deformation resistance. The friction coefficient increases rapidly over time before stabilizing, with the lowest average friction coefficient (0.75). At this bias −60 V, the coating demonstrated a low wear rate, while a higher substrate bias led to severe abrasive wear. Tuning the substrate bias voltage, allowed for effectively optimizing the microstructure, mechanical properties, frictional behavior, and wear resistance of CrAlN coatings. Notably, CrAlN coatings prepared at a substrate bias of −60 V exhibited exceptional mechanical properties and wear resistance, providing a crucial theoretical and experimental foundation for enhancing their performance in practical applications.

     

/

返回文章
返回