王曾隽, 马肇曾, 葛葆云, 文耀典. 低温化学气相沉积氮化钛[J]. 工程科学学报, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015
引用本文: 王曾隽, 马肇曾, 葛葆云, 文耀典. 低温化学气相沉积氮化钛[J]. 工程科学学报, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015
Wang Cengjuan, Ma Zhaoceng, Ge Baoyun, Wen Yaodian. Chemical Vapour Deposition of Titanium Nitride at Lower Temperatures[J]. Chinese Journal of Engineering, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015
Citation: Wang Cengjuan, Ma Zhaoceng, Ge Baoyun, Wen Yaodian. Chemical Vapour Deposition of Titanium Nitride at Lower Temperatures[J]. Chinese Journal of Engineering, 1983, 5(1): 176-181. DOI: 10.13374/j.issn1001-053x.1983.01.015

低温化学气相沉积氮化钛

Chemical Vapour Deposition of Titanium Nitride at Lower Temperatures

  • 摘要: 用纯氨做原料在钢铁表面进行化学气相沉积氮化钛时,可使沉积温度降到570℃以下。高速钢刀具经沉积后不需再行淬火处理。本文介绍了沉积反应时纯氨的制备以及为降低沉积温度的沉积条件选择等。样品经此处理后,涂层生长速率为2.7μ2.5(μm)/hr,涂展硬度HV0,05,约为1700kg/mm2。X射线衍射分析证明表面为TiN。

     

    Abstract: The deposition temperature can be hold below 570℃ by using pure ammonia durnig CVD of TiN on the surface of iron and steel parts. After deposition quenching is not necessery for the tools nmade of high speed steel. The preparation of pure ammonia used for deposition and the optinum condition for deposition at lower temperature were investigaled. The deposition rate is 2.5/μm/hr, the hardness of the layer of deposition is about 1700kg/mm2, X-Rays diffraction indicates that the product of deposition on the surface is TiN.

     

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