硬质合金上化学气相沉积TiC和TiC<sub>X</sub>N<sub>Y</sub>的研究

硬质合金上化学气相沉积TiC和TiC_XN_Y的研究

摘要: 在TiCl₄-C₆H₅CH₃-H₂和TiCl₄-C₆H₅-H₂-N₂体系中,以YG₈硬质合金为基体,用化学气相沉积(CVD)法,研究了温度,反应物输入浓度对沉积TiC和TiC_xN_y涂层的沉积速度,显微硬度和形貌的影响。结果表明:TiC沉积速度,显微硬度随沉积温度升高而增大,对TiC沉积层的形貌也有较大的影响。TiC和TiC_xN_y的沉积速度、显微硬度随反应物摩尔比(mc/Ti)增加到某一最大值后又下降;mc/Ti=1时,TiC硬度呈最佳值。mc/Ti=0.87时,TiC_xN_y硬度出现最大值。此外,还对基体一涂层间是否出现η相进行了分析。并测定了在1223~1323K间TiC沉积反应的表观活化能为157.9kJ/mol。

Abstract: The deposition ratd and microhardnoss of the coating ofTiC and TiC_xN_y increase with input molar ratio (m_c/Ti) and the maximum microhardness of TiC and TiC_xN_y are achieved as the ratio is 1 and 0.87 respectively. The coalings identified by X-ray di ff ractometer is TiC and TiC_xN_y. When m=0.94-1.47. deposition temperature at 1 223-1 323 K. the η phase at interlayer between the substrate and TiC coaling is not formed; m_c/Ti=0.68-1.54. at 1 248K, N₂/H₂=1/2. the coating only is TiC_xN_y; m_c/Ti ≤ 0.28. the η phase is formed. The apparent activation energy of TiC is 157.9 kJ/mol. It proves that the deposition process is controlled by surface process.