袁逸, 杨保雄, 白元强, 王建军, 吕反修. 微波等离子体CVD金刚石薄膜的显微结构[J]. 工程科学学报, 1994, 16(3): 245-249. DOI: 10.13374/j.issn1001-053x.1994.03.010
引用本文: 袁逸, 杨保雄, 白元强, 王建军, 吕反修. 微波等离子体CVD金刚石薄膜的显微结构[J]. 工程科学学报, 1994, 16(3): 245-249. DOI: 10.13374/j.issn1001-053x.1994.03.010
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Yuan Yi, Yang Baoxiong, Bai Yuanqiang, Wang Jianjun, Lu Fanxiu. Microstructure of Diamond Thin Films by Microwave Plasma CVD[J]. Chinese Journal of Engineering, 1994, 16(3): 245-249. DOI: 10.13374/j.issn1001-053x.1994.03.010
Citation: Yuan Yi, Yang Baoxiong, Bai Yuanqiang, Wang Jianjun, Lu Fanxiu. Microstructure of Diamond Thin Films by Microwave Plasma CVD[J]. Chinese Journal of Engineering, 1994, 16(3): 245-249. DOI: 10.13374/j.issn1001-053x.1994.03.010
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微波等离子体CVD金刚石薄膜的显微结构

Microstructure of Diamond Thin Films by Microwave Plasma CVD

    摘要
  • 摘要: 用扫描电镜(SEM)和透射电镜(TEM)对6种微波等离子体CVD金刚石薄膜的表面形态和显微结构进行了研究.结果表明:在金刚石晶粒长大过程中,(111)面方向长大时产生密度很高的微孪晶缺陷,而(100)面方向长大时产生的晶体缺陷较少.

     

    Abstract: The morphology and the microstructure of six different dianond films deposited by microwave plasma CVD have been studied by SEM and TEM.The observations of microstructure indicate that high dencity microtwins are formed during the(111)planes growth and a few of crystal defects are formed during the(100) planes growth.

     

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