NiO钉扎的自旋阀的结构和磁性

Structure and Magnetism in NiO Spin-valve

摘要: 利用反应溅射的方法制备了NiO薄膜,并研究了NiO对NiFe薄膜的钉扎作用,结果表明钉扎场与反应溅射时的Ar/O₂比例、总的溅射气压、基底的粗糙度等有很大关系.利用光电子能谱(XP)分析了NiO_x中的Ni,O离子的价态.并制备了NiO钉扎的自旋阀Ta/NiO/NiFe/Cu/NiFe/Ta,其磁电阻(MR)可达到2.2%,钉扎场为10.48kA/m.

Abstract: The exchange fields of NiO/NiFe bilayer have been investigated, and the NiO film is deposited by dc magnetron reactive sputtering.It has been shown that exchange field is relation to the ratio of Ar/O₂ (Volume ration), total sputtering pressure and the roughness of substrate.The Ni and O ion in NiO_x is analyzed by means of XPS.The spin-vavie Ta/NiO/NiFe/Cu/NiFe/Ta pinned by NiO is deposited, and its magne-toresistance reaches 2.2% and pinning field is 10.48 KA/m.