毛卫民, 张弘. 大规模集成电路导电薄膜的织构效应[J]. 工程科学学报, 2000, 22(6): 539-542. DOI: 10.13374/j.issn1001-053x.2000.06.014
引用本文: 毛卫民, 张弘. 大规模集成电路导电薄膜的织构效应[J]. 工程科学学报, 2000, 22(6): 539-542. DOI: 10.13374/j.issn1001-053x.2000.06.014
MAO Weimin, ZHANG Hong. Texture Effect of Interconnection Thin Films in Very Large-Scale Integrated Electronic Circuits[J]. Chinese Journal of Engineering, 2000, 22(6): 539-542. DOI: 10.13374/j.issn1001-053x.2000.06.014
Citation: MAO Weimin, ZHANG Hong. Texture Effect of Interconnection Thin Films in Very Large-Scale Integrated Electronic Circuits[J]. Chinese Journal of Engineering, 2000, 22(6): 539-542. DOI: 10.13374/j.issn1001-053x.2000.06.014

大规模集成电路导电薄膜的织构效应

Texture Effect of Interconnection Thin Films in Very Large-Scale Integrated Electronic Circuits

  • 摘要: 利用X射线技术检测了普通工艺和改进工艺制备的内联导电铝膜的织构.分析表明,高体积量且锋锐的111面织构可以大幅度降低大规模集成电路芯片的失效率.讨论了失效的原因及111织构的有利作用.指出了新一代内联导电铜膜相应织构问题的重要性.

     

    Abstract: The texture of interconnecting aluminum films prepared by conventional and modified technology was examined using X-ray diffraction It is demonstrated, that the high volume fraction and high sharpness of the 111 fiber texture will drastically reduce the invalidation ratio of very large-scale integrated electronic circuits. The reasons of invalidation and the positive effects of the 111 fiber texture are discussed. It is pointed out, that attention should be paid to the corresponding texture problems in new interconnecting copper films.

     

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