刘敬明, 蒋政, 张恒大, 吕反修, 唐伟忠. 大面积CVD金刚石膜的热铁板抛光[J]. 工程科学学报, 2001, 23(1): 42-44. DOI: 10.13374/j.issn1001-053x.2001.01.038
引用本文: 刘敬明, 蒋政, 张恒大, 吕反修, 唐伟忠. 大面积CVD金刚石膜的热铁板抛光[J]. 工程科学学报, 2001, 23(1): 42-44. DOI: 10.13374/j.issn1001-053x.2001.01.038
LIU Jingming, JIANG Zheng, ZHANG Hengda, LV Fanxiu, TANG Weizhong. Thermo-Chemical Polishing of Large Area CVD Diamond Films[J]. Chinese Journal of Engineering, 2001, 23(1): 42-44. DOI: 10.13374/j.issn1001-053x.2001.01.038
Citation: LIU Jingming, JIANG Zheng, ZHANG Hengda, LV Fanxiu, TANG Weizhong. Thermo-Chemical Polishing of Large Area CVD Diamond Films[J]. Chinese Journal of Engineering, 2001, 23(1): 42-44. DOI: 10.13374/j.issn1001-053x.2001.01.038

大面积CVD金刚石膜的热铁板抛光

Thermo-Chemical Polishing of Large Area CVD Diamond Films

  • 摘要: 研制成功国内第1台大面积CVD金刚石膜热铁板抛光机.它可以在10-3Pa真空条件下,加热到1 100℃;抛光台可以在0~10 r/min间实现无级调速,一次完成3片φ110 mm的金刚石膜的抛光.金刚石膜在980℃,2 h抛光的结果表明该装置有良好的抛光效果.金刚石膜在980℃抛光不同时间的Raman谱表明,金刚石热铁板抛光是金刚石石墨化和C原子不断扩散的过程.

     

    Abstract: The first domestic thermo-chemical polishing apparatus is setup. Three φl10 mm in diameter diamond films can be polished simultaneously at 10-3Pa from 750℃ to 100℃, with the polishing rate increasing with increasing temperature. The results of polishing at 980℃ showed that polishing of CVD diamond films is very efficient. Thermo-chemical polishing mechanism is based on the transformation of diamond into graphite and the atomic dissolution of carbon into a hot metal.

     

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