YU Guanghua, ZHU Fengwu, MA Jidong, WANG Anrong. Angle-resolved XPS Studies of Magnetic Multilayers Ta/NiO/NiFe/Ta[J]. Chinese Journal of Engineering, 2002, 24(2): 191-193. DOI: 10.13374/j.issn1001-053x.2002.02.024
Citation: YU Guanghua, ZHU Fengwu, MA Jidong, WANG Anrong. Angle-resolved XPS Studies of Magnetic Multilayers Ta/NiO/NiFe/Ta[J]. Chinese Journal of Engineering, 2002, 24(2): 191-193. DOI: 10.13374/j.issn1001-053x.2002.02.024

Angle-resolved XPS Studies of Magnetic Multilayers Ta/NiO/NiFe/Ta

  • Ta/NiO/NiFe/Ta multilayers were prepared by magnetron sputtering. The composition and chemical states at the interface region of NiO/NiFe were studied using the angle-resolved X-ray photoelectron spectroscopy (XPS). The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni+FeO and 3NiO+2Fe =3 Ni+Fe2O3 The thickness of the chemical reaction as estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products are magnetic defects, and- the exchange coupling field Hex and the coercivity Hc of NiO/NiFe are affected by these defects.
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